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Abstract:
The holes with diameters in the nanometer range was created in the Al2O3/NiAl(110) substrate if metal clusters deposited on it are irradiated by the intense convergent electron beam in a transmission electron microscope. The localisation and size of holes can be controlled to some extent. The formation of holes can be interrupted by lowering the beam intensity below a critical value. It can be continued by increasing the intensity above the threshold value. We have also disclosed the necessity of clusters' presence on the surface for the start of holes' formation. It was shown earlier that holes thus created are characterized the perfect crystallographic faceting. The method for producing a single nanohole has been described in the present paper.image processing.
