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  Structural and Chemical Properties of NiOx Thin Films: Oxygen Vacancy Formation in O-2 Atmosphere

Blume, R., Calvet, W., Ghafari, A., Mayer, T., Knop-Gericke, A., & Schögl, R. (2023). Structural and Chemical Properties of NiOx Thin Films: Oxygen Vacancy Formation in O-2 Atmosphere. ChemPhysChem, e202300231, pp. 1-11. doi:10.1002/cphc.202300231.

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 Creators:
Blume, Raoul1, Author           
Calvet, Wolfram2, Author
Ghafari, Aliakbar1, Author           
Mayer, Thomas2, Author
Knop-Gericke, Axel1, Author           
Schögl, Robert1, Author           
Affiliations:
1Research Department Schlögl, Max Planck Institute for Chemical Energy Conversion, Max Planck Society, ou_3023874              
2external, ou_persistent22              

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Language(s): eng - English
 Dates: 2023
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: ISI: 001072819500001
DOI: 10.1002/cphc.202300231
 Degree: -

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Title: ChemPhysChem
Source Genre: Journal
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Publ. Info: Weinheim, Germany : Wiley-VCH
Pages: - Volume / Issue: - Sequence Number: e202300231 Start / End Page: 1 - 11 Identifier: ISSN: 1439-4235
CoNE: https://pure.mpg.de/cone/journals/resource/954925409790