Enhancing the Electrochemical and Electronic Performance of CVD-Grown Graphene 
by Minimizing Trace Metal Impurities

Iost, R. M.; Crespilho, F. N.; Zuccaro, L.; Yu, H. K.; Wodtke, A. M.; Kern, K.; Balasubramanian, K.

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Enhancing the Electrochemical and Electronic Performance of CVD-Grown Graphene by Minimizing Trace Metal Impurities

Iost, R. M., Crespilho, F. N., Zuccaro, L., Yu, H. K., Wodtke, A. M., Kern, K., et al. (2014). Enhancing the Electrochemical and Electronic Performance of CVD-Grown Graphene by Minimizing Trace Metal Impurities. ChemElectroChem, 1(12), 2070-2074.

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Item Permalink: https://hdl.handle.net/21.11116/0000-000E-C94E-9 Version Permalink: https://hdl.handle.net/21.11116/0000-000E-C94F-8

Genre: Journal Article

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Creators:
Iost, R. M., Author
Crespilho, F. N., Author
Zuccaro, L., Author
Yu, H. K., Author
Wodtke, A. M., Author
Kern, K.¹, Author
Balasubramanian, K.¹, Author

Affiliations:
1Department Nanoscale Science (Klaus Kern), Max Planck Institute for Solid State Research, Max Planck Society, ou_3370481

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Language(s): eng - English

Dates: Date issued: 2014

Publication Status: Issued

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Identifiers: eDoc: 698688
ISI: 000346275900005

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Title: ChemElectroChem

Source Genre: Journal

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Pages: - Volume / Issue: 1 (12) Sequence Number: - Start / End Page: 2070 - 2074 Identifier: ISSN: 2196-0216