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  Semiconductor sub-micro-/nanochannel networks by deterministic layer wrinkling

Mei, Y. F., Thurmer, D. J., Cavallo, F., Kiravittaya, S., & Schmidt, O. G. (2007). Semiconductor sub-micro-/nanochannel networks by deterministic layer wrinkling. Advanced Materials, 19(16), 2124-2128.

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 Creators:
Mei, Y. F.1, Author           
Thurmer, D. J.1, Author           
Cavallo, F.1, Author           
Kiravittaya, S.1, Author           
Schmidt, O. G.1, 2, 3, 4, Author           
Affiliations:
1Former Scientific Facilities, Max Planck Institute for Solid State Research, Max Planck Society, ou_3370501              
2Department Nanoscale Science (Klaus Kern), Max Planck Institute for Solid State Research, Max Planck Society, ou_3370481              
3Scientific Facility Nanostructuring Lab (Jürgen Weis), Max Planck Institute for Solid State Research, Max Planck Society, ou_3370499              
4Abteilung v. Klitzing, Former Departments, Max Planck Institute for Solid State Research, Max Planck Society, ou_3370504              

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 Abstract: Semiconductor micro-/nanochannel networks are developed by deterministic layer wrinkling and applied into a fluidics study. Both linear (see figure) and circular nanochannel networks, consisting of a main channel and several perpendicularly oriented branch channels, are created, where the periodicity and position of the branch channels can be tuned and controlled by changing the width of the partially released layers and by applying appropriate lithography.

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Language(s): eng - English
 Dates: 2007
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: eDoc: 338709
ISI: 000249023200014
 Degree: -

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Title: Advanced Materials
Source Genre: Journal
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Pages: - Volume / Issue: 19 (16) Sequence Number: - Start / End Page: 2124 - 2128 Identifier: ISSN: 0935-9648