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  Enhanced TC in SrRuO3/DyScO3(110) thin films with high residual resistivity ratio

Schreiber, N. J., Miao, L., Nair, H. P., Ruf, J. P., Bhatt, L., Birkholzer, Y. A., et al. (2023). Enhanced TC in SrRuO3/DyScO3(110) thin films with high residual resistivity ratio. APL Materials, 11(11), 1-7. doi:10.1063/5.0156344.

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 Urheber:
Schreiber, Nathaniel J.1, Autor
Miao, Ludi1, Autor
Nair, Hari P.1, Autor
Ruf, Jacob P.2, Autor           
Bhatt, Lopa1, Autor
Birkholzer, Yorick A.1, Autor
Kotsonis, George N.1, Autor
Kourkoutis, Lena F.1, Autor
Shen, Kyle M.1, Autor
Schlom, Darrell G.1, Autor
Affiliations:
1External Organizations, ou_persistent22              
2Physics of Quantum Materials, Max Planck Institute for Chemical Physics of Solids, Max Planck Society, ou_1863462              

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Schlagwörter: Dysprosium compounds, Molecular beam epitaxy, Ruthenium compounds, Single crystals, Thin films, Bulk single crystals, Electrical quality, Enhanced T, Ferromagnetics, Intrinsic strain, Molecular-beam epitaxy, Property, Residual resistivity ratios, Thin-films, Strontium compounds
 Zusammenfassung: Epitaxial untwinned SrRuO3 thin films were grown on (110)-oriented DyScO3 substrates by molecular-beam epitaxy. We report an exceptional sample with a residual resistivity ratio (RRR), ρ [300 K]/ρ [4 K] of 205 and a ferromagnetic Curie temperature, TC, of 168.3 K. We compare the properties of this sample to other SrRuO3 films grown on DyScO3(110) with RRRs ranging from 8.8 to 205, and also compare it to the best reported bulk single crystal of SrRuO3. We determine that SrRuO3 thin films grown on DyScO3(110) have an enhanced TC as long as the RRR of the thin film is above a minimum electrical quality threshold. This RRR threshold is about 20 for SrRuO3. Films with lower RRR exhibit TCs that are significantly depressed from the intrinsic strain-enhanced value. © 2023 Author(s).

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Sprache(n): eng - English
 Datum: 2023-11-012023-11-01
 Publikationsstatus: Erschienen
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 Ort, Verlag, Ausgabe: -
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 Art der Begutachtung: -
 Identifikatoren: DOI: 10.1063/5.0156344
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Titel: APL Materials
  Kurztitel : APL Mater.
Genre der Quelle: Zeitschrift
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Ort, Verlag, Ausgabe: AIP Scitation
Seiten: - Band / Heft: 11 (11) Artikelnummer: - Start- / Endseite: 1 - 7 Identifikator: CoNE: https://pure.mpg.de/cone/journals/resource/2166-532X