A Cu3BHT-Graphene van der Waals Heterostructure with Strong Interlayer Coupling 
for Highly Efficient Photoinduced Charge Separation

Wang, Zhiyong; Fu, Shuai; Zhang, Wenjie; Liang, Baokun; Liu, Tsai-Jung; Hambsch, Mike; Pöhls, Jonas F.; Wu, Yufeng; Zhang, Jianjun; Lan, Tianshu; Li, Xiaodong; Qi, Haoyuan; Polozij, Miroslav; Mannsfeld, Stefan C. B.; Kaiser, Ute; Bonn, Mischa; Weitz, R. Thomas; Heine, Thomas; Parkin, Stuart S. P.; Wang, Hai I.; Dong, Renhao; Feng, Xinliang

doi:10.1002/adma.202311454

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A Cu₃BHT-Graphene van der Waals Heterostructure with Strong Interlayer Coupling for Highly Efficient Photoinduced Charge Separation

Wang, Z., Fu, S., Zhang, W., Liang, B., Liu, T.-J., Hambsch, M., et al. (2024). A Cu₃BHT-Graphene van der Waals Heterostructure with Strong Interlayer Coupling for Highly Efficient Photoinduced Charge Separation. Advanced Materials, 2311454. doi:10.1002/adma.202311454.

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Item Permalink: https://hdl.handle.net/21.11116/0000-000E-B404-2 Version Permalink: https://hdl.handle.net/21.11116/0000-000F-32DC-1

Genre: Journal Article

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Creators:
Wang, Zhiyong, Author
Fu, Shuai^{1, 2}, Author
Zhang, Wenjie, Author
Liang, Baokun, Author
Liu, Tsai-Jung, Author
Hambsch, Mike, Author
Pöhls, Jonas F., Author
Wu, Yufeng, Author
Zhang, Jianjun, Author
Lan, Tianshu, Author
Li, Xiaodong, Author
Qi, Haoyuan, Author
Polozij, Miroslav, Author
Mannsfeld, Stefan C. B., Author
Kaiser, Ute, Author
Bonn, Mischa¹, Author
Weitz, R. Thomas, Author
Heine, Thomas, Author
Parkin, Stuart S. P., Author
Wang, Hai I.^{1, 3}, Author
Dong, Renhao, AuthorFeng, Xinliang, Author more..

Affiliations:
1Dept. Bonn: Molecular Spectroscopy, MPI for Polymer Research, Max Planck Society, ou_1800285
2Tech Univ Dresden, Ctr Adv Elect Dresden, Dresden, Germany, ou_persistent22
3Nanophotonics, Debye Institute for Nanomaterials Science, Utrecht University, Utrecht, The Netherlands, ou_persistent22

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Language(s): eng - English

Dates: Published Online: 2024-02-21Date issued: 2024

Publication Status: Issued

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Table of Contents: -

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Identifiers: DOI: 10.1002/adma.202311454

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Title: Advanced Materials

Abbreviation : Adv. Mater.

Source Genre: Journal

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Publ. Info: Weinheim : Wiley-VCH

Pages: - Volume / Issue: - Sequence Number: 2311454 Start / End Page: - Identifier: ISSN: 0935-9648
CoNE: https://pure.mpg.de/cone/journals/resource/954925570855