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  Effect of the atomic structure of complexions on the active disconnection mode during shear-coupled grain boundary motion

Pemma, S., Janisch, R., Dehm, G., & Brink, T. (2024). Effect of the atomic structure of complexions on the active disconnection mode during shear-coupled grain boundary motion. Physical Review Materials, 8(6): 063602. doi:10.1103/PhysRevMaterials.8.063602.

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PhysRevMaterials.8.063602.pdf (Publisher version), 9MB
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PhysRevMaterials.8.063602.pdf
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 Creators:
Pemma, Swetha1, Author           
Janisch, Rebecca2, Author           
Dehm, Gerhard3, Author           
Brink, Tobias1, Author           
Affiliations:
1Atomistic Modelling of Material Interfaces, Project Groups, Structure and Nano-/ Micromechanics of Materials, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_3291845              
2Mechanical Properties of interfaces Department of Micromechanical and Macroscopic Modelling, ICAMS, Ruhr-Universität Bochum, Germany, ou_persistent22              
3Structure and Nano-/ Micromechanics of Materials, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863398              

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Language(s): eng - English
 Dates: 2024-05-232024-06-102024
 Publication Status: Issued
 Pages: -
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 Rev. Type: -
 Identifiers: DOI: 10.1103/PhysRevMaterials.8.063602
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Title: Physical Review Materials
  Abbreviation : Phys. Rev. Mater.
Source Genre: Journal
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Publ. Info: College Park, MD : American Physical Society
Pages: 17 Volume / Issue: 8 (6) Sequence Number: 063602 Start / End Page: - Identifier: ISSN: 2475-9953
CoNE: https://pure.mpg.de/cone/journals/resource/2475-9953