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  Non-Aqueous Routes to Metal Oxide Thin Films by Atomic Layer Deposition

Rauwel, E., Clavel, G., Willinger, M. G., Rauwel, P., & Pinna, N. (2008). Non-Aqueous Routes to Metal Oxide Thin Films by Atomic Layer Deposition. Angewandte Chemie International Edition, 47(19), 3592-3595. doi:10.1002/anie.200705550.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-FF12-2 Version Permalink: https://hdl.handle.net/21.11116/0000-0007-5846-8
Genre: Journal Article

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 Creators:
Rauwel, Erwan, Author
Clavel, Guylhaine, Author
Willinger, Marc Georg1, Author           
Rauwel, Protima, Author
Pinna, Nicola, Author
Affiliations:
1Inorganic Chemistry, Fritz Haber Institute, Max Planck Society, ou_24023              

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Free keywords: atomic layer deposition; metal oxides; nanostructures; sol-gel processes; thin films Bulk and surface structure in catalysis
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Language(s): eng - English
 Dates: 2008
 Publication Status: Issued
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 Rev. Type: Peer
 Identifiers: eDoc: 403304
DOI: 10.1002/anie.200705550
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Title: Angewandte Chemie International Edition
  Other : Angewandte Chemie - International Edition
  Abbreviation : Angew. Chem. Int. Ed.
Source Genre: Journal
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Publ. Info: Weinheim : Wiley-VCH
Pages: - Volume / Issue: 47 (19) Sequence Number: - Start / End Page: 3592 - 3595 Identifier: CoNE: https://pure.mpg.de/cone/journals/resource/201310171