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  Oxygen-deficient line defects in an ultrathin aluminium oxide film

Schmid, M., Shishkin, M., Kresse, G., Napetschnig, E., Varga, P., Kulawik, M., et al. (2006). Oxygen-deficient line defects in an ultrathin aluminium oxide film. Physical Review Letters, 97(4), 046101-1-046101-4. doi:10.1103/PhysRevLett.97.046101.

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 Creators:
Schmid, Michael, Author
Shishkin, Maxim, Author
Kresse, Georg, Author
Napetschnig, Evelyn, Author
Varga, Peter, Author
Kulawik, Maria1, Author           
Nilius, Niklas1, Author           
Rust, Hans-Peter1, Author           
Freund, Hans-Joachim1, Author           
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1Chemical Physics, Fritz Haber Institute, Max Planck Society, ou_24022              

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Free keywords: scanning tunneling microscope; augmented-wave method; NiAl(110); layer
 Abstract: A model for the straight antiphase domain boundary of the ultrathin aluminum oxide film on the NiAl(110) substrate is derived from scanning tunneling microscopy measurements and density-functional theory calculations. Although the local bonding environment of the perfect film is maintained, the structure is oxygen deficient and possesses a favorable adsorption site. The domain boundary exhibits a downwards band bending and three characteristic unoccupied electronic states, in excellent agreement with scanning tunneling spectroscopy measurements.

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Language(s): eng - English
 Dates: 2006-07-28
 Publication Status: Issued
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 Rev. Type: Peer
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Title: Physical Review Letters
  Alternative Title : Phys. Rev. Lett.
Source Genre: Journal
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Pages: - Volume / Issue: 97 (4) Sequence Number: - Start / End Page: 046101-1 - 046101-4 Identifier: -