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  Atomic structure of a thin silica film on a Mo(112) substrate: A two-dimensional network of SiO4 tetrahedra

Weissenrieder, J., Kaya, S., Lu, J.-L., Gao, H.-J., Shaikhutdinov, S., Freund, H.-J., et al. (2005). Atomic structure of a thin silica film on a Mo(112) substrate: A two-dimensional network of SiO4 tetrahedra. Physical Review Letters, 95(07), 076103–1-076103–4. doi:10.1103/PhysRevLett.95.076103.

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e076103.pdf (Publisher version), 297KB
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e076103.pdf
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2005
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APS
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 Creators:
Weissenrieder, Jonas1, Author           
Kaya, Sarp1, Author           
Lu, Jun-Ling1, Author           
Gao, Hong-Jun, Author
Shaikhutdinov, Shamil1, Author           
Freund, Hans-Joachim1, Author           
Sierka, Marek, Author
Todorova, Tanya K., Author
Sauer, Joachim, Author
Affiliations:
1Chemical Physics, Fritz Haber Institute, Max Planck Society, ou_24022              

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Free keywords: silicon compounds; scanning tunnelling microscopy; reflectivity; infrared spectra; X-ray photoelectron spectra; density functional theory; insulating thin films
 Abstract: The structure of a thin single crystalline SiO2 film grown on Mo(112) has been studied by scanning tunneling microscopy, infrared reflection absorption spectroscopy, and x-ray photoelectron spectroscopy. In excellent agreement with the experimental results, density functional theory calculations show that the film consists of a two-dimensional network of corner sharing [SiO4] tetrahedra, with one oxygen of each tetrahedron binding to the protruding Mo atoms of the Mo(112) surface.

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Language(s): eng - English
 Dates: 2005-08-12
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Degree: -

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Title: Physical Review Letters
  Other : Phys. Rev. Lett.
Source Genre: Journal
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Publ. Info: Woodbury, N.Y., etc. : American Physical Society.
Pages: - Volume / Issue: 95 (07) Sequence Number: - Start / End Page: 076103–1 - 076103–4 Identifier: ISSN: 0031-9007
CoNE: https://pure.mpg.de/cone/journals/resource/954925433406