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  Reactivity of Nanocrystalline Sulfated Zirconia Thin Films

Lloyd, R., Jentoft, F. C., & Schlögl, R. (2005). Reactivity of Nanocrystalline Sulfated Zirconia Thin Films. Poster presented at XXXVIII. Jahrestreffen Deutscher Katalytiker, weimar, Germany.

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 Creators:
Lloyd, Rhys1, Author           
Jentoft, Friederike C.1, Author           
Schlögl, Robert1, Author           
Affiliations:
1Inorganic Chemistry, Fritz Haber Institute, Max Planck Society, ou_24023              

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Free keywords: Calcination, Film, Image, Isomerisation, Preparation, Synthesis Project 3, Zirconium oxide model systems
 Abstract: Introduction Sulfated zirconia (SZ) has been found to be catalytically active for the isomerization of n-butane at room temperature [1]. This discovery has led to numerous investigations into the catalyst; however, no consistent theories have been devised to satisfactorily describe the nature of the active sites [2]. In order to improve surface characterization, a model system consisting of a nanocrystalline SZ thin film supported on a silicon wafer has previously been developed [3]. The present work addresses two issues: the role of the atmosphere during thermal treatment and the validation of the model through demonstration of its reactivity towards n-butane. [1] M. Hino, K. Arata., J. Am. Chem. Soc. 101 (1979) 6439. [2] X. Song and A. Sayari, Catal. Rev. - Sci. Eng. 38 (1996) 329. [3] F.C. Jentoft, A. Fischer, G. Weinberg, U. Wild, R. Schlögl, Stud. Surf. Sci. Cat. 130 (2000) 209.

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Language(s): eng - English
 Dates: 2005-06-15
 Publication Status: Not specified
 Pages: -
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 Rev. Type: -
 Identifiers: eDoc: 276480
 Degree: -

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Title: XXXVIII. Jahrestreffen Deutscher Katalytiker
Place of Event: weimar, Germany
Start-/End Date: 2005-03-16 - 2005-03-18

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