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キーワード:
Molecular beam epitaxy; scanning tunneling microscopy; growth; surface structure; morphology; roughness; and topography; quantum dots; gallium arsenide; indium arsenide; single crystal surfaces; Scanning-Tunneling-Microscopy; Molecular-Beam Epitaxy; Highly Mismatched Heteroepitaxy; Energy Electron-Diffraction; High-Index Surfaces; Optical-Properties; Coherent Islands; (311)B GaAs; Semiconductor Surfaces; High-Temperature
要旨:
In recent years, the self-assembled growth of semiconductor nanostructures, that show quantum size effects, has been of considerable interest. Laser devices operating with self-assembled InAs quantum dots (QDs) embedded in GaAs have been demonstrated. Here, we report on the InAs/GaAs system and raise the question of how the shape of the QDs changes with the orientation of the GaAs substrate. The growth of the InAs QDs is understood in terms of the Stranski-Krastanow growth mode. For modeling the growth process, the shape and atomic structure of the QDs have to be known. This is a difficult task for such embedded entities.
In our approach, InAs is grown by molecular beam epitaxy on GaAs until self-assembled QDs are formed. At this point the growth is interrupted and atomically resolved scanning tunneling microscopy (STM) images are acquired. We used preparation parameters known from the numerous publications on InAs/GaAs. In order to learn more about the self-assemblage process we studied QD formation on different GaAs(0 0 1), (1 1 3)A, and (1 1 3 )B substrates. From the atomically resolved STM images we could determine the shape of the QDs. The quantum "dots" are generally rather flat entities better characterized as "lenses". In order to achieve this flatness, the QDs are terminated by high-index bounding facets on low-index substrates and vice versa. Our results will be summarized in comparison with the existing literature.
