Etching behaviour of alpha-recoil tracks in natural dark mica studied via 
artificial ion tracks.

Lang, M.; Glasmacher, U. A.; Neumann, R.; Wagner, G. A.

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Etching behaviour of alpha-recoil tracks in natural dark mica studied via artificial ion tracks.

Lang, M., Glasmacher, U. A., Neumann, R., & Wagner, G. A. (2003). Etching behaviour of alpha-recoil tracks in natural dark mica studied via artificial ion tracks. Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions with Materials & Atoms, 209, 357-361.

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Datensatz-Permalink: https://hdl.handle.net/11858/00-001M-0000-0011-8E5E-9 Versions-Permalink: https://hdl.handle.net/11858/00-001M-0000-0011-8E5F-7

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Urheber:
Lang, M.¹, Autor
Glasmacher, U. A.², Autor
Neumann, R.³, Autor
Wagner, G. A.², Autor

Affiliations:
1Ralf Srama - Heidelberg Dust Group, Research Groups, MPI for Nuclear Physics, Max Planck Society, ou_907558
2Guest Group Archaeometry, MPI for Nuclear Physics, Max Planck Society, ou_904552
3GSI D-64291 Darmstadt Germany, ou_persistent22