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  Development of a metrology to characterize EUV optics at 13.5nm

Vongehr, M., Predehl, P., & Hasinger, G. (2006). Development of a metrology to characterize EUV optics at 13.5nm. In J. T. Sheridan, & F. Wyrowski (Eds.), Photon Management II (pp. 618709-1-618709-9). Bellingham, Wash., USA: The International Society for Optical Engineering.

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 Creators:
Vongehr, Monika1, Author              
Predehl, Peter1, Author              
Hasinger, Günther1, Author              
Affiliations:
1High Energy Astrophysics, MPI for Extraterrestrial Physics, Max Planck Society, ou_159890              

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Language(s): eng - English
 Dates: 2006-10
 Publication Status: Published in print
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: -
 Identifiers: eDoc: 289826
DOI: 10.1117/12.662816
Other: PH 50/160, p.618709-1-9
 Degree: -

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Title: Photon Management II
Place of Event: Strasbourg, France
Start-/End Date: 2006-04-03 - 2006-04-04

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Title: Photon Management II
Source Genre: Proceedings
 Creator(s):
Sheridan, John T., Editor
Wyrowski, Frank, Editor
Affiliations:
-
Publ. Info: Bellingham, Wash., USA : The International Society for Optical Engineering
Pages: - Volume / Issue: - Sequence Number: - Start / End Page: 618709-1 - 618709-9 Identifier: ISBN: 0-8194-6243-8

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Title: SPIE Proceedings Series
Source Genre: Series
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Publ. Info: -
Pages: - Volume / Issue: 6187 Sequence Number: - Start / End Page: - Identifier: -