Control of plasma properties in capacitively coupled oxygen discharges via the 
electrical asymmetry effect

Schüngel, E.; Zhang, Q.-Z.; Iwashita, S.; Schulze, J.; Hou, L.-J.; Wang, Y.-N.; Czarnetzki, U.

doi:10.1088/0022-3727/44/28/285205

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Control of plasma properties in capacitively coupled oxygen discharges via the electrical asymmetry effect

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Hou, L.-J.
Theory and Complex Plasmas, MPI for Extraterrestrial Physics, Max Planck Society;

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Schüngel, E., Zhang, Q.-Z., Iwashita, S., Schulze, J., Hou, L.-J., Wang, Y.-N., et al. (2011). Control of plasma properties in capacitively coupled oxygen discharges via the electrical asymmetry effect. Journal of Physics D: Applied Physics, 44(28): 285205, pp. 1-14. doi:10.1088/0022-3727/44/28/285205.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0012-1A59-0

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