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Conference Paper

Feature Sensitive Bas Relief Generation

MPS-Authors
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Kerber,  Jens
Computer Graphics, MPI for Informatics, Max Planck Society;

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Tevs,  Art
Computer Graphics, MPI for Informatics, Max Planck Society;
International Max Planck Research School, MPI for Informatics, Max Planck Society;

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Zayer,  Rhaleb
Computer Graphics, MPI for Informatics, Max Planck Society;

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Belyaev,  Alexander
Computer Graphics, MPI for Informatics, Max Planck Society;

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Seidel,  Hans-Peter       
Computer Graphics, MPI for Informatics, Max Planck Society;

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Citation

Kerber, J., Tevs, A., Zayer, R., Belyaev, A., & Seidel, H.-P. (2009). Feature Sensitive Bas Relief Generation. In J.-H. Yong, M. Spagnuolo, & W. Wang (Eds.), IEEE International Conference on Shape Modeling and Applications Proceedings (pp. 148-154). Washington, USA: IEEE Computer Society Press.


Cite as: https://hdl.handle.net/11858/00-001M-0000-000F-19AD-0
Abstract
Among all forms of sculpture, bas-relief is arguably the closest to painting.
Although inherently a two dimensional sculpture, a bas-relief suggests a visual
spatial extension of the scene in depth through the combination of composition,
perspective, and shading. Most recently, there have been significant results on
digital bas-relief generation but many of the existing techniques may wash out
high level surface detail during the compression process. The primary goal of
this work is to address the problem of fine features by tailoring a filtering
technique that achieves good compression without compromising the quality of
surface details. As a secondary application we explore the generation of
artistic relief which mimic cubism in painting and we show how it could be used
for generating Picasso like portraits.