English
 
Help Privacy Policy Disclaimer
  Advanced SearchBrowse

Item

ITEM ACTIONSEXPORT

Released

Book Chapter

Thin film plasma deposition of allylamine; Effects of solvent treatment

MPS-Authors
/persons/resource/persons48416

Menges,  B.
MPI for Polymer Research, Max Planck Society;

/persons/resource/persons47885

Förch,  Renate
MPI for Polymer Research, Max Planck Society;

/persons/resource/persons48198

Knoll,  Wolfgang
MPI for Polymer Research, Max Planck Society;

External Resource
No external resources are shared
Fulltext (restricted access)
There are currently no full texts shared for your IP range.
Fulltext (public)
There are no public fulltexts stored in PuRe
Supplementary Material (public)
There is no public supplementary material available
Citation

van Os, M. T., Menges, B., Förch, R., Knoll, W., Timmons, R. B., & Vancso, G. J. (1999). Thin film plasma deposition of allylamine; Effects of solvent treatment. In W. W. Lee, R. d’Agostino, M. R. Wertheimer, & B. D. Ratner (Eds.), Plasma Deposition and Treatment of Polymers (pp. 45-50). Warrendale, PA: Materials Research Society.


Cite as: https://hdl.handle.net/11858/00-001M-0000-000F-54D4-B
Abstract
There is no abstract available