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Surface modification with orthogonal photosensitive silanes for sequential chemical lithography and site-selective particle deposition

MPS-Authors
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del Campo,  A.
MPI for Polymer Research, Max Planck Society;

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Boos,  D.
MPI for Polymer Research, Max Planck Society;

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Spiess,  Hans Wolfgang
MPI for Polymer Research, Max Planck Society;

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Jonas,  Ulrich
MPI for Polymer Research, Max Planck Society;

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del Campo, A., Boos, D., Spiess, H. W., & Jonas, U. (2005). Surface modification with orthogonal photosensitive silanes for sequential chemical lithography and site-selective particle deposition. Angewandte Chemie International Edition, 44(30), 4707-4712. doi:10.1002/anie.200500092.


Cite as: http://hdl.handle.net/11858/00-001M-0000-000F-5C46-5
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