Surface modification with orthogonal photosensitive silanes for sequential 
chemical lithography and site-selective particle deposition

del Campo, A.; Boos, D.; Spiess, Hans Wolfgang; Jonas, Ulrich

doi:10.1002/anie.200500092

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Surface modification with orthogonal photosensitive silanes for sequential chemical lithography and site-selective particle deposition

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del Campo, A.
MPI for Polymer Research, Max Planck Society;

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Boos, D.
MPI for Polymer Research, Max Planck Society;

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Spiess, Hans Wolfgang
MPI for Polymer Research, Max Planck Society;

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Jonas, Ulrich
MPI for Polymer Research, Max Planck Society;

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del Campo, A., Boos, D., Spiess, H. W., & Jonas, U. (2005). Surface modification with orthogonal photosensitive silanes for sequential chemical lithography and site-selective particle deposition. Angewandte Chemie International Edition, 44(30), 4707-4712. doi:10.1002/anie.200500092.

Cite as: http://hdl.handle.net/11858/00-001M-0000-000F-5C46-5

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