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In-situ thin film diagnostics using waveguide mode spectroscopy

MPS-Authors
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Jacobsen,  V.
MPI for Polymer Research, Max Planck Society;

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Menges,  B.
MPI for Polymer Research, Max Planck Society;

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Förch,  Renate
MPI for Polymer Research, Max Planck Society;

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Mittler,  Silvia
MPI for Polymer Research, Max Planck Society;

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Knoll,  Wolfgang
MPI for Polymer Research, Max Planck Society;

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Citation

Jacobsen, V., Menges, B., Förch, R., Mittler, S., & Knoll, W. (2002). In-situ thin film diagnostics using waveguide mode spectroscopy. Thin Solid Films, 409(2), 185-193.


Cite as: http://hdl.handle.net/11858/00-001M-0000-000F-6615-A
Abstract
A new method for in-situ film characterisation during thin film deposition processes was developed using waveguide mode spectroscopy. The advantages of the method are a high sensitivity for thin films in the nm-regime and a relatively simple and low-cost set-up. The detection method relies on a double grating coupler allowing a background-free detection of the propagation constants of guided optical modes. The set-up is based on a reflected mode m-line geometry requiring no moving parts. The method was applied to thin film diagnostics in plasma-assisted deposition processes and allowed for the simultaneous determination of thickness and refractive index of the plasma polymer film during deposition. The in-situ waveguide mode spectrometer was also used to monitor gas phase reactions of plasma polymerised maleic anhydride thin films on- line. (C) 2002 Elsevier Science B.V. All rights reserved.