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Near-Field Lithography by Two-Photon-Induced Photocleavage of Organic Monolayers

MPS-Authors
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Alvarez,  M.
MPI for Polymer Research, Max Planck Society;

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Best,  A.
MPI for Polymer Research, Max Planck Society;

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Unger,  A.
MPI for Polymer Research, Max Planck Society;

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del Campo,  Aranzazu
MPI for Polymer Research, Max Planck Society;

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Schmelzeisen,  M.
MPI for Polymer Research, Max Planck Society;

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Koynov,  Kaloian
MPI for Polymer Research, Max Planck Society;

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Kreiter,  Max
MPI for Polymer Research, Max Planck Society;

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Citation

Alvarez, M., Best, A., Unger, A., Alonso, J. M., del Campo, A., Schmelzeisen, M., et al. (2010). Near-Field Lithography by Two-Photon-Induced Photocleavage of Organic Monolayers. Advanced Functional Materials, 20(24), 4265-4272.


Cite as: http://hdl.handle.net/11858/00-001M-0000-000F-7432-8
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