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Journal Article

Tantalum-oxide catalysed chemical vapour deposition of single- and multi-walled carbon nanotubes

MPS-Authors
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Knop-Gericke,  Axel
Inorganic Chemistry, Fritz Haber Institute, Max Planck Society;

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Schlögl,  Robert
Inorganic Chemistry, Fritz Haber Institute, Max Planck Society;

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Citation

Bayer, B. C., Castellarin-Cudia, C., Blume, R., Steiner, S. A., Ducati, C., Chu, D., et al. (2013). Tantalum-oxide catalysed chemical vapour deposition of single- and multi-walled carbon nanotubes. RSC Advances, 3(12), 4086-4092. doi:10.1039/C3RA23304A.


Cite as: https://hdl.handle.net/11858/00-001M-0000-0010-0CE3-3
Abstract
Ta-oxide thin films are shown to catalyse carbon nanotube growth by chemical
vapour deposition. A low film thickness, the nature of the support material (best
results with SiO2) and an atmospheric process gas pressure are of key importance for
successful nanotube nucleation. Strong material interactions, such as silicide
formation, inhibit nanotube growth. In-situ X-ray photoelectron spectroscopy
indicates that no catalyst reduction to a metal or carbide occurs during nanotube
growth and that the catalytically active phase is the Ta-oxide phase. Such a reductionfree
oxide catalyst can be advantageous for integration of nanotubes into electronics.