Efficient formation and cleavage of disilanes by potassium-graphite. Silylation 
with silyl metal reagents

Fürstner, Alois; Weidmann, Hans

doi:10.1016/0022-328X(88)80634-X

アイテム詳細

登録内容を編集ファイル形式で保存

一時保存へ追加

タグ情報を表示リリース履歴を表示詳細要約

公開

学術論文

Efficient formation and cleavage of disilanes by potassium-graphite. Silylation with silyl metal reagents

MPS-Authors

There are no MPG-Authors in the publication available

External Resource

There are no locators available

Fulltext (restricted access)

There are currently no full texts shared for your IP range.

フルテキスト (公開)

公開されているフルテキストはありません

付随資料 (公開)

There is no public supplementary material available

引用

Fürstner, A., & Weidmann, H. (1988). Efficient formation and cleavage of disilanes by potassium-graphite. Silylation with silyl metal reagents. Journal of Organometallic Chemistry, 354(1), 15-21. doi:10.1016/0022-328X(88)80634-X.

引用: https://hdl.handle.net/11858/00-001M-0000-0010-259D-0

要旨

Potassium-graphite laminate (C₈K) very rapidly forms disilanes from chlorosilanes and then rapidly cleaves the disilanes to give silyl potassium reagents which can be converted into potassium silyl cuprates, -manganates, and -vanadates that are useful for nucleophilic substitution and addition reactions.