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Pipe-diffusion ripening of Si precipitates in Al-0.5% Cu-1%Si thin films

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Dehm,  G.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Balk,  T. J.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Arzt,  E.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;
Universität Stuttgart, Institut für Metallkunde;

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Citation

Legros, M., Kaouache, B., Gergaud, P., Thomas, O., Dehm, G., Balk, T. J., et al. (2005). Pipe-diffusion ripening of Si precipitates in Al-0.5% Cu-1%Si thin films. Philosophical Magazine, 85, 3541-3552.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0010-2854-7
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