Interaction of amorphous Si and crystalline Al thin films during 
low-temperature annealing in vaccum

Zhao, Y. H.; Wang, J. Y.; Mittemeijer, E. J.

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Interaction of amorphous Si and crystalline Al thin films during low-temperature annealing in vaccum

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Zhao, Y. H.
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Wang, J. Y.
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Mittemeijer, E. J.
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;
Universität Stuttgart, Institut für Materialwissenschaft;

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Zhao, Y. H., Wang, J. Y., & Mittemeijer, E. J. (2003). Interaction of amorphous Si and crystalline Al thin films during low-temperature annealing in vaccum. Thin Solid Films, 433, 82-87.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0010-2D76-2

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