Growth of electromigration-induced hillocks in Al interconnects

Nucci, J. A.; Straub, A.; Bischoff, E.; Arzt, E.; Volkert, C. A.

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Growth of electromigration-induced hillocks in Al interconnects

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Nucci, J. A.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Straub, A.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Bischoff, E.
Former Central Scientific Facility Metallography, Max Planck Institute for Intelligent Systems, Max Planck Society;
Former Dept. Microstructure Interfaces, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Arzt, E.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;
Universität Stuttgart, Institut für Metallkunde;

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Volkert, C. A.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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引用

Nucci, J. A., Straub, A., Bischoff, E., Arzt, E., & Volkert, C. A. (2002). Growth of electromigration-induced hillocks in Al interconnects. Journal of Materials Research, 17(10), 2727-2735.

引用: https://hdl.handle.net/11858/00-001M-0000-0010-2FE6-B

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