Designed fully lamellar microstructures in a γ-TiAl based alloy: adjustment and 
microstructural changes upon long-term isothermal exposure at 700 and 800 
degrees C

Beschliesser, M.; Chatterjee, A.; Lorich, A.; Knabl, W.; Kestler, H.; Dehm, G.; Clemens, H.

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Designed fully lamellar microstructures in a γ-TiAl based alloy: adjustment and microstructural changes upon long-term isothermal exposure at 700 and 800 degrees C

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Chatterjee, A.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Dehm, G.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Clemens, H.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Beschliesser, M., Chatterjee, A., Lorich, A., Knabl, W., Kestler, H., Dehm, G., et al. (2002). Designed fully lamellar microstructures in a γ-TiAl based alloy: adjustment and microstructural changes upon long-term isothermal exposure at 700 and 800 degrees C. Materials Science and Engineering A-Structural Materials Properties Microstructure and Processing, 329, 124-129.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0010-30D7-4

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