High spatial resolution grain orientation and strain mapping in thin films 
using polychromatic submicron X-ray diffraction.

Tamura, N.; MacDowell, A. A.; Celestre, R. S.; Padmore, H. A.; Valek, B.; Bravman, J. C.; Spolenak, R.; Brown, W. L.; Marieb, T.; Fujimoto, H.; Batterman, B. W.; Patel, J. R.

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High spatial resolution grain orientation and strain mapping in thin films using polychromatic submicron X-ray diffraction.

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Spolenak, R.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Tamura, N., MacDowell, A. A., Celestre, R. S., Padmore, H. A., Valek, B., Bravman, J. C., et al. (2002). High spatial resolution grain orientation and strain mapping in thin films using polychromatic submicron X-ray diffraction. Applied Physics Letters, 80(20), 3724-3726.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0010-310A-C

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