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Electron-irradiation-induced amorphization in Mo/Si nano- multilayer material

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Phillipp,  F.
Former Dept. Microstructure Interfaces, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Shioya, E., Suda, T., Watanabe, S., Ohnuki, S., Ishino, M., Yoda, O., et al. (2002). Electron-irradiation-induced amorphization in Mo/Si nano- multilayer material. Materials Transactions, 43(4), 650-653.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0010-31A9-4
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