Chemical liquid deposition of gallium nitride thin films on siloxane-anchored 
self-assembled monolayers

Niesen, T. P.; Puchinger, M.; Gerstel, P.; Rodewald, D.; Wolff, J.; Wagner, T.; Bill, J.; Aldinger, F.

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Chemical liquid deposition of gallium nitride thin films on siloxane-anchored self-assembled monolayers

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Niesen, T. P.
Former Dept. Materials Synthesis and Microstructure Design, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Puchinger, M.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Gerstel, P.
Former Dept. Materials Synthesis and Microstructure Design, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Wagner, T.
Central Scientific Facility Thin Film Laboratory, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Aldinger, F.
Former Dept. Materials Synthesis and Microstructure Design, Max Planck Institute for Intelligent Systems, Max Planck Society;
Universität Stuttgart, Institut für Nichtmetallische Anorganische Materialien;

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Niesen, T. P., Puchinger, M., Gerstel, P., Rodewald, D., Wolff, J., Wagner, T., et al. (2002). Chemical liquid deposition of gallium nitride thin films on siloxane-anchored self-assembled monolayers. Materials Chemistry and Physics, 73(2-3), 301-305.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0010-3245-D

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