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Conference Paper

Microstructure of Physical Vapour Deposited Ti-Si-N Coatings

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Kauffmann,  F.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Dehm,  G.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Arzt,  E.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;
Universität Stuttgart, Institut für Metallkunde;

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Beck,  T.
Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Citation

Kauffmann, F., Dehm, G., Arzt, E., Schier, V., Henke, S., Schattke, A., et al. (2002). Microstructure of Physical Vapour Deposited Ti-Si-N Coatings. In R. K. Singk, R. Partck, M. Muhammed, M. Senna, & H. Hofmann (Eds.), Nanoparticulate Materials (pp. W7.3.1-W7.3.6).


Cite as: https://hdl.handle.net/11858/00-001M-0000-0010-32BA-5
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