Texture of Sputtered Thin Copper Films on Amorphous SiO2 und Si3N4 Substrates

Okolo, B.; Lamparter, P.; Welzel, U.; Wagner, T.; Mittemeijer, E. J.

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Texture of Sputtered Thin Copper Films on Amorphous SiO₂ und Si₃N₄ Substrates

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Okolo, B.
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Lamparter, P.
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Welzel, U.
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Wagner, T.
Central Scientific Facility Thin Film Laboratory, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Mittemeijer, E. J.
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;
Universität Stuttgart, Institut für Materialwissenschaft;

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引用

Okolo, B., Lamparter, P., Welzel, U., Wagner, T., & Mittemeijer, E. J. (2002). Texture of Sputtered Thin Copper Films on Amorphous SiO₂ und Si₃N₄ Substrates. In C., Ozkan, R., Cammarata, L., Freund, & H., Gao (Eds.), Thin Films: Stresses and Mechanical Properties IX (pp. L2.9-L2.14). Warrendale, PA: MRS.

引用: https://hdl.handle.net/11858/00-001M-0000-0010-331A-7

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