A new approach to understanding electromigration in Al(Cu) alloys on an 
atomistic basis

Schmidt, C.; Dekker, J. P.; Gumbsch, P.; Arzt, E.

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A new approach to understanding electromigration in Al(Cu) alloys on an atomistic basis

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Gumbsch, P.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Arzt, E.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;
Universität Stuttgart, Institut für Metallkunde;

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Schmidt, C., Dekker, J. P., Gumbsch, P., & Arzt, E. (2001). A new approach to understanding electromigration in Al(Cu) alloys on an atomistic basis. In Y. Limoge (Ed.), Proceedings of DIMAT 2000, the Fifth International Conference on Diffusion in Materials (pp. 151-156). Uetikon-Zürich: Scitec Publications Ltd.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0010-35EB-E

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