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The effect of film thickness on stress and transformation behavior in cobalt thin films

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Hesemann,  H.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Müllner,  P.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Kraft,  O.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Arzt,  E.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;
Universität Stuttgart, Institut für Metallkunde;

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Citation

Hesemann, H., Müllner, P., Kraft, O., & Arzt, E. (2000). The effect of film thickness on stress and transformation behavior in cobalt thin films. In R. Vinci (Ed.), Thin Films - Stresses and Mechanical Properties VIII (pp. 219-224). Pittsburgh, Pa.: MRS.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0010-37B6-1
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