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Comparative study of the growth of sputtered aluminum oxide films on organic and inorganic substrates

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Sellner,  S.
Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Schreiber,  F.
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Dosch,  H.
Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society;
Universität Stuttgart, Institut für Theoretische und Angewandte Physik;

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Sellner, S., Gerlach, A., Kowarik, S., Schreiber, F., Dosch, H., Meyer, S., et al. (2008). Comparative study of the growth of sputtered aluminum oxide films on organic and inorganic substrates. Thin Solid Films, (516), 6377-6381.


Cite as: https://hdl.handle.net/11858/00-001M-0000-0010-403F-E
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