Interdiffusion, phase formation, and stress development in Cu-Pd thin-film 
diffusion couples: interface thermodynamics and mechanisms

Chakraborty, J.; Welzel, U.; Mittemeijer, E. J.

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Interdiffusion, phase formation, and stress development in Cu-Pd thin-film diffusion couples: interface thermodynamics and mechanisms

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Chakraborty, J.
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Welzel, U.
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Mittemeijer, E. J.
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;
Universität Stuttgart, Institut für Materialwissenschaft;

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Chakraborty, J., Welzel, U., & Mittemeijer, E. J. (2008). Interdiffusion, phase formation, and stress development in Cu-Pd thin-film diffusion couples: interface thermodynamics and mechanisms. Journal of Applied Physics, 103, 113-512.

引用: https://hdl.handle.net/11858/00-001M-0000-0010-40C8-5

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