Grain-boundary plane orientation dependence of electrical barriers at Σ5 
boundaries in SrTiO3

Lee, S. B.; Lee, J.-H.; Cho, Y.-H.; Kim, D.-Y.; Sigle, W.; Phillipp, F.; van Aken, P. A.

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Grain-boundary plane orientation dependence of electrical barriers at Σ5 boundaries in SrTiO₃

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Lee, S. B.
Stuttgart Center for Electron Microscopy, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Sigle, W.
Stuttgart Center for Electron Microscopy, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Phillipp, F.
Stuttgart Center for Electron Microscopy, Max Planck Institute for Intelligent Systems, Max Planck Society;

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van Aken, P. A.
Stuttgart Center for Electron Microscopy, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Lee, S. B., Lee, J.-H., Cho, Y.-H., Kim, D.-Y., Sigle, W., Phillipp, F., et al. (2008). Grain-boundary plane orientation dependence of electrical barriers at Σ5 boundaries in SrTiO₃. Acta Materialia, 56, 4993-4997.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0010-413A-0

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