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Interdiffusion and stress development in Cu-Pd thin film diffusion couples.

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Kuru,  Y.
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Wohlschlögel,  M.
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Welzel,  U.
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Mittemeijer,  E. J.
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;
Universität Stuttgart, Institut für Materialwissenschaft;

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Citation

Kuru, Y., Wohlschlögel, M., Welzel, U., & Mittemeijer, E. J. (2008). Interdiffusion and stress development in Cu-Pd thin film diffusion couples. Thin Solid Films, 516, 7615-7626.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0010-4195-F
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