Oxidation and reduction of ultrathin nanocrystalline Ru films on silicon: model 
system for Ru-capped extreme ultraviolet lithography optics

He, Y.B; Goriachko, A.; Korte, C.; Farkas, A.; Mellau, G.; Dudin, P.; Gregoratti, L.; Barinov, A.; Kiskinova, M.; Stierle, A.; Kasper, N.; Bajt, S.; Over, H.

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Oxidation and reduction of ultrathin nanocrystalline Ru films on silicon: model system for Ru-capped extreme ultraviolet lithography optics

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He, Y.B
Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Stierle, A.
Former Central Scientific Facility ANKA Synchroton Beamline, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Kasper, N.
Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society;

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He, Y., Goriachko, A., Korte, C., Farkas, A., Mellau, G., Dudin, P., et al. (2007). Oxidation and reduction of ultrathin nanocrystalline Ru films on silicon: model system for Ru-capped extreme ultraviolet lithography optics. Journal of Physical Chemistry C, 111(24), 10988-10992.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0010-42A9-E

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