English
 
Help Privacy Policy Disclaimer
  Advanced SearchBrowse
  1. View item / 
  2. Item Summary

Item

ITEM ACTIONSEXPORT
Add to Basket
  Local TagsRelease HistoryDetailsSummary

Released
Journal Article

Electron energy-loss spectroscopy study of a multilayered SiOx and SiOxCy film prepared by plasma-enhanced chemical vapor deposition

MPS-Authors
/persons/resource/persons76328

Zhang,  Z.
Former Dept. Microstructure Interfaces, Max Planck Institute for Intelligent Systems, Max Planck Society;

/persons/resource/persons76249

Wagner,  T.
Central Scientific Facility Thin Film Laboratory, Max Planck Institute for Intelligent Systems, Max Planck Society;

/persons/resource/persons76113

Sigle,  W.
Former Dept. Microstructure Interfaces, Max Planck Institute for Intelligent Systems, Max Planck Society;
Stuttgart Center for Electron Microscopy, Max Planck Institute for Intelligent Systems, Max Planck Society;

External Resource
No external resources are shared
Fulltext (restricted access)
There are currently no full texts shared for your IP range.
Fulltext (public)
There are no public fulltexts stored in PuRe
Supplementary Material (public)
There is no public supplementary material available
Citation

Zhang, Z., Wagner, T., Sigle, W., & Schulz, A. (2006). Electron energy-loss spectroscopy study of a multilayered SiOx and SiOxCy film prepared by plasma-enhanced chemical vapor deposition. Journal of Materials Research, 21, 608-612.


Cite as: https://hdl.handle.net/11858/00-001M-0000-0010-4805-A
Abstract
There is no abstract available