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Epitaxy and bonding of Cu films on oxygen-terminated α-Al2O3(0001) surfaces

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Wagner,  T.
Central Scientific Facility Thin Film Laboratory, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Rühle,  M.
Emeriti and Others, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Oh, S. H., Scheu, C., Wagner, T., Tchernychova, E., & Rühle, M. (2006). Epitaxy and bonding of Cu films on oxygen-terminated α-Al2O3(0001) surfaces. Acta Materialia, 54, 2685-2696.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0010-487A-2
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