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Near-field lithography by two-photon-induced photocleavage of organic monolayers

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Alonso,  J. M.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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del Campo,  A.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Citation

Álvarez, M., Best, A., Unger, A., Alonso, J. M., del Campo, A., Schmelzeisen, M., et al. (2010). Near-field lithography by two-photon-induced photocleavage of organic monolayers. Advanced Funktional Functions, 20(24), 4265-4272. doi:10.1002/adfm.201000939.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0010-4F50-C
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