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Support effects on the atomic structure of ultrathin silica films on metals

MPS-Authors
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Yu,  Xin
Chemical Physics, Fritz Haber Institute, Max Planck Society;

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Yang,  Bing
Chemical Physics, Fritz Haber Institute, Max Planck Society;

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Boscoboinik,  Anibal
Chemical Physics, Fritz Haber Institute, Max Planck Society;

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Shaikhutdinov,  Shamil Kamilovich
Chemical Physics, Fritz Haber Institute, Max Planck Society;

/persons/resource/persons21524

Freund,  Hans-Joachim
Chemical Physics, Fritz Haber Institute, Max Planck Society;

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edoc 1578016.pdf
(Any fulltext), 78KB

1.3703609.pdf
(Publisher version), 2MB

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Citation

Yu, X., Yang, B., Boscoboinik, A., Shaikhutdinov, S. K., & Freund, H.-J. (2012). Support effects on the atomic structure of ultrathin silica films on metals. Applied Physics Letters, 100(15): 151608. doi:10.1063/1.3703609.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0010-507B-3
Abstract
We studied the atomic structure of ultrathin silica films on Pt(111) in comparison with the previously studied films on Mo(112) and Ru(0001). The results obtained by scanning tunneling microscopy, photoelectron spectroscopy, and infrared reflection absorption spectroscopy suggest that the metal-oxygen bond strength plays the decisive role in the atomic structure of the silica overlayers on metal substrates. Metals with high oxygen adsorption energy favor the formation of the crystalline monolayer SiO2.5 films, whereas noble metals form primarily vitreous SiO2 bilayer films. The metals with intermediate energies may form either of the structures or both coexisting. In the systems studied, the lattice mismatch plays only a minor role.