English
 
Help Privacy Policy Disclaimer
  Advanced SearchBrowse

Item

ITEM ACTIONSEXPORT

Released

Journal Article

Reversible photon-induced oxidation of graphene by NO2 adsorption

MPS-Authors
/persons/resource/persons21385

Böttcher,  Stefan
Physical Chemistry, Fritz Haber Institute, Max Planck Society;

/persons/resource/persons22200

Vita,  Hendrik
Physical Chemistry, Fritz Haber Institute, Max Planck Society;

/persons/resource/persons21640

Horn,  Karsten
Physical Chemistry, Fritz Haber Institute, Max Planck Society;

External Resource
No external resources are shared
Fulltext (restricted access)
There are currently no full texts shared for your IP range.
Fulltext (public)

manuscript_accepted.pdf
(Any fulltext), 3MB

Supplementary Material (public)
There is no public supplementary material available
Citation

Böttcher, S., Vita, H., & Horn, K. (2014). Reversible photon-induced oxidation of graphene by NO2 adsorption. Surface Science, 621, 117-122. doi:10.1016/j.susc.2013.11.010.


Cite as: https://hdl.handle.net/11858/00-001M-0000-0014-BBD3-1
Abstract
We show that an oxidized graphene sheet is formed by NO2 adsorption and subsequent photodissociation, through an analysis of x-ray absorption and photoemission spectroscopic results. Adsorption of NO2 on graphene grown on Ir(111) leads to a strong rehybridization of the unoccupied π* states and the appearance of new features in the C 1s core level line. This is a reversible process, such that pristine graphene can be recovered by thermal treatment. The formation of oxidized graphene is sensitive to the photon-flux, resulting in an intermediate phase of oxidized graphene. Our results provide an interesting pathway towards lithographic patterning processes in graphene.