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Effect of chemical etching on poly(methyl methacrylate) irradiated with slow highly charged ions

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Ginzel,  Rainer
Division Prof. Dr. Joachim H. Ullrich, MPI for Nuclear Physics, Max Planck Society;

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Crespo López-Urrutia,  José R.
Division Prof. Dr. Joachim H. Ullrich, MPI for Nuclear Physics, Max Planck Society;

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Ritter, R., Wilhelm, R. A., Ginzel, R., Schadauer, P., Heller, R., Rupp, W., et al. (2013). Effect of chemical etching on poly(methyl methacrylate) irradiated with slow highly charged ions. Physica Scripta T, 156: 014065, 1-3. doi:10.1088/0031-8949/2013/T156/014065.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0014-BB17-9
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