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Material Editing in Complex Scenes by Surface Light Field Manipulation and Reflectance Optimization

MPG-Autoren
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Nguyen,  Chuong
Computer Graphics, MPI for Informatics, Max Planck Society;

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Scherzer,  Daniel
Computer Graphics, MPI for Informatics, Max Planck Society;

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Ritschel,  Tobias
Computer Graphics, MPI for Informatics, Max Planck Society;

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Seidel,  Hans-Peter
Computer Graphics, MPI for Informatics, Max Planck Society;

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Zitation

Nguyen, C., Scherzer, D., Ritschel, T., & Seidel, H.-P. (2013). Material Editing in Complex Scenes by Surface Light Field Manipulation and Reflectance Optimization. Computer Graphics Forum, 32(2), 185-194. doi:10.1111/cgf.12038.


Zitierlink: http://hdl.handle.net/11858/00-001M-0000-0015-3810-8
Zusammenfassung
This work addresses the challenge of intuitive appearance editing in scenes with complex geometric layout and complex, spatially-varying indirect lighting. In contrast to previous work, that aimed to edit surface reflectance, our system allows a user to freely manipulate the surface light field. It then finds the best surface reflectance that ``explains'' the surface light field manipulation. Instead of classic \mathcal L_2 fitting of reflectance to a combination of incoming and exitant illumination, our system infers a sparse \mathcal L_0 change of shading parameters instead. Consequently, our system does not require ``diffuse'' or ``glossiness'' brushes or any such understanding of the underlying reflectance parametrization. Instead, it infers reflectance changes from scribbles made by a single simple color brush tool alone: Drawing a highlight will increase Phong specular; blurring a mirror reflection will decrease glossiness; etc. A sparse-solver framework operating on a novel point-based, pre-convolved lighting representation in combination with screen-space edit upsampling allows to perform editing interactively on a GPU.