Large-Gap Quantum Spin Hall Insulators in Tin Films

Xu, Y.; Yan, B.; Zhang, H. J.; Wang, J.; Xu, G.; Tang, P. Z.; Duan, W. H.; Zhang, S. C.

doi:10.1103/PhysRevLett.111.136804

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Large-Gap Quantum Spin Hall Insulators in Tin Films

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Yan, B.
Binghai Yan, Inorganic Chemistry, Max Planck Institute for Chemical Physics of Solids, Max Planck Society;

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Citation

Xu, Y., Yan, B., Zhang, H. J., Wang, J., Xu, G., Tang, P. Z., et al. (2013). Large-Gap Quantum Spin Hall Insulators in Tin Films. Physical Review Letters, 111(13): 136804, pp. 136804-1-136804-5. doi:10.1103/PhysRevLett.111.136804.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0015-1E4E-1

Abstract

The search for large-gap quantum spin Hall (QSH) insulators and effective approaches to tune QSH states is important for both fundamental and practical interests. Based on first-principles calculations we find two-dimensional tin films are QSH insulators with sizable bulk gaps of 0.3 eV, sufficiently large for practical applications at room temperature. These QSH states can be effectively tuned by chemical functionalization and by external strain. The mechanism for the QSH effect in this system is band inversion at the Gamma point, similar to the case of a HgTe quantum well. With surface doping of magnetic elements, the quantum anomalous Hall effect could also be realized.