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The First Silicon-Based Cationic Clathrate III with High Thermal Stability: Si172-xPxTey (x = 2y, y > 20)

MPS-Authors
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Zaikina,  J. V.
Max Planck Institute for Chemical Physics of Solids, Max Planck Society;

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Kovnir,  K. A.
Max Planck Institute for Chemical Physics of Solids, Max Planck Society;

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Haarmann,  F.
Chemical Metal Science, Max Planck Institute for Chemical Physics of Solids, Max Planck Society;

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Schnelle,  W.
Walter Schnelle, Inorganic Chemistry, Max Planck Institute for Chemical Physics of Solids, Max Planck Society;

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Burkhardt,  U.
Ulrich Burkhardt, Chemical Metal Science, Max Planck Institute for Chemical Physics of Solids, Max Planck Society;

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Borrmann,  H.
Horst Borrmann, Chemical Metal Science, Max Planck Institute for Chemical Physics of Solids, Max Planck Society;

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Schwarz,  U.
Ulrich Schwarz, Chemical Metal Science, Max Planck Institute for Chemical Physics of Solids, Max Planck Society;

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Grin,  Y.
Juri Grin, Chemical Metal Science, Max Planck Institute for Chemical Physics of Solids, Max Planck Society;

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Citation

Zaikina, J. V., Kovnir, K. A., Haarmann, F., Schnelle, W., Burkhardt, U., Borrmann, H., et al. (2008). The First Silicon-Based Cationic Clathrate III with High Thermal Stability: Si172-xPxTey (x = 2y, y > 20). Chemistry - A European Journal, 14, 5414-5422. doi:10.1002/chem.200800453.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0015-2811-5
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