Self-assembly and crystallization behavior of mesoporous, crystalline HfO2 thin 
films : a model system for the generation of mesostructured transition-metal 
oxides

Brezesinski, T.; Smarsly, B.; Iimura, K.; Grosso, D.; Boissiere, C.; Amenitsch, H.; Antonietti, M.; Sanchez, C.

doi:10.1002/smll.200500024

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Self-assembly and crystallization behavior of mesoporous, crystalline HfO₂ thin films : a model system for the generation of mesostructured transition-metal oxides

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Brezesinski, T.
Kolloidchemie, Max Planck Institute of Colloids and Interfaces, Max Planck Society;

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Smarsly, B.
Kolloidchemie, Max Planck Institute of Colloids and Interfaces, Max Planck Society;

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Antonietti, M.
Markus Antonietti, Kolloidchemie, Max Planck Institute of Colloids and Interfaces, Max Planck Society;

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Brezesinski, T., Smarsly, B., Iimura, K., Grosso, D., Boissiere, C., Amenitsch, H., et al. (2005). Self-assembly and crystallization behavior of mesoporous, crystalline HfO₂ thin films: a model system for the generation of mesostructured transition-metal oxides. Small, 1(8-9), 889-898. doi: 10.1002/smll.200500024.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0015-5D21-0

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