Evaporation temperature-tuned physical vapor deposition growth engineering of 
one-dimensional non-Fermi liquid tetrathiofulvalene tetracyanoquinodimethane 
thin films

Sarkar, I.; Laux, M.; Demokritova, J.; Ruffing, A.; Mathias, S.; Wei, J.; Solovyeva, V.; Rudloff, M.; Naghavi, S. S.; Felser, C.; Huth, M.; Aeschlimann, M.

doi:10.1063/1.3489098

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Evaporation temperature-tuned physical vapor deposition growth engineering of one-dimensional non-Fermi liquid tetrathiofulvalene tetracyanoquinodimethane thin films

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Citation

Sarkar, I., Laux, M., Demokritova, J., Ruffing, A., Mathias, S., Wei, J., et al. (2010). Evaporation temperature-tuned physical vapor deposition growth engineering of one-dimensional non-Fermi liquid tetrathiofulvalene tetracyanoquinodimethane thin films. Applied Physics Letters, 97(11): 111906, pp. 1-3. doi:10.1063/1.3489098.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0018-A4D8-C

Abstract

We describe the growth of high quality tetrathiofulvalene tetracyanoquinodimethane (TTF-TCNQ) organic charge-transfer thin films which show a clear non-Fermi liquid behavior. Temperature dependent angle resolved photoemission spectroscopy and electronic structure calculations show that the growth of TTF-TCNQ films is accompanied by the unfavorable presence of neutral TTF and TCNQ molecules. The quality of the films can be controlled by tuning the evaporation temperature of the precursor in physical vapor deposition method. (C) 2010 American Institute of Physics. [doi:10.1063/1.3489098]