Modulation of electrochemical hydrogen evolution rate by araliphatic thiol 
monolayers on gold

Muglali, Mutlu Iskender; Erbe, Andreas; Chen, Ying; Barth, Christoph; Koelsch, Patrick; Rohwerder, Michael

doi:10.1016/j.electacta.2012.11.116

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Modulation of electrochemical hydrogen evolution rate by araliphatic thiol monolayers on gold

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Muglali, Mutlu Iskender
Corrosion, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

/persons/resource/persons125132

Erbe, Andreas
Interface Spectroscopy, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Chen, Ying
Center for Electrochemical Sciences (CES), Ruhr-Universität Bochum, 44801 Bochum, Germany;
Interface Spectroscopy, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

/persons/resource/persons125346

Rohwerder, Michael
Corrosion, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Muglali, M. I., Erbe, A., Chen, Y., Barth, C., Koelsch, P., & Rohwerder, M. (2013). Modulation of electrochemical hydrogen evolution rate by araliphatic thiol monolayers on gold. Electrochimica Acta, 90, 17-26. doi:10.1016/j.electacta.2012.11.116.

引用: https://hdl.handle.net/11858/00-001M-0000-0019-2582-5

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